| 摘要 |
A sputtering target for magnetic recording media, characterized in that the B-rich phase has an average grain area of 90 µm2 or less; and a process for producing a sputtering target for magnetic recording media, the process being characterized by heat-treating an alloy ingot, subsequently subjecting the heat-treated ingot to primary rolling which includes at least one cold-rolling pass, thereafter subjecting the rolled alloy to secondary rolling, and machining the rolled alloy into a target. The sputtering target for magnetic recording media has few cracks in the B-rich phase and has a high leakage flux density. With this target, discharge during sputtering is stabilized and the arcing which occurs from cracks of the B-rich phase is inhibited. Thus, the problem of inhibiting the generation of particles is eliminated. |
