| 发明名称 |
POLISHING COMPOSITION AND POLISHING METHOD USING SAME |
| 摘要 |
A polishing composition used in an application to polish silicon nitride is characterized by containing colloidal silica in which an organic acid, such as a sulfonic acid or a carboxylic acid, is immobilized, and having a pH of 6 or less. |
| 申请公布号 |
KR20130101022(A) |
申请公布日期 |
2013.09.12 |
| 申请号 |
KR20137006921 |
申请日期 |
2011.08.10 |
| 申请人 |
FUJIMI INCORPORATED |
发明人 |
MIZUNO TAKAHIRO;YOKOTA SHUUGO;YAMATO YASUYUKI;AKATSUKA TOMOHIKO |
| 分类号 |
C09K3/14;B24B37/00;H01L21/304 |
主分类号 |
C09K3/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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