发明名称 LITHOGRAPHY SYSTEM AND METHOD FOR PROCESSING A TARGET, SUCH AS A WAFER.
摘要 A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck.
申请公布号 NL2010415(A) 申请公布日期 2013.09.10
申请号 NL20132010415 申请日期 2013.03.08
申请人 MAPPER LITHOGRAPHY IP B.V. 发明人 VERGEER NIELS
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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