发明名称 |
Photoresist composition |
摘要 |
The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.
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申请公布号 |
US8530135(B2) |
申请公布日期 |
2013.09.10 |
申请号 |
US20100888243 |
申请日期 |
2010.09.22 |
申请人 |
YAMAGUCHI SATOSHI;KIM SOON SHIN;YOSHIDA ISAO;ICHIKAWA KOJI;SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
YAMAGUCHI SATOSHI;KIM SOON SHIN;YOSHIDA ISAO;ICHIKAWA KOJI |
分类号 |
G03F7/039;G03F7/20;G03F7/30;G03F7/38 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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