发明名称 |
Vacuum processing apparatus and operating method for vacuum processing apparatus |
摘要 |
An operation method for cleaning a vacuum processing apparatus includes feeding a cleaning gas into a film deposition chamber of the vacuum processing apparatus when a predetermined number of batches of film deposition process is finished. The predetermined number of batch of film deposition processes is calculated based on a film deposition-related operating time (a film deposition time and a film deposition preparation time) and a cleaning-related operating time (a cleaning procedure time, a cleaning procedure preparation time, and a pre-deposition film deposition time).
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申请公布号 |
US8529704(B2) |
申请公布日期 |
2013.09.10 |
申请号 |
US20080864624 |
申请日期 |
2008.06.27 |
申请人 |
SASAKAWA EISHIRO;SAKAKI MASAHIRO;UENO SHIGEKAZU;KAWAMURA KEISUKE;TAKANO AKEMI;MITSUBISHI HEAVY INDUSTRIES, LTD. |
发明人 |
SASAKAWA EISHIRO;SAKAKI MASAHIRO;UENO SHIGEKAZU;KAWAMURA KEISUKE;TAKANO AKEMI |
分类号 |
B08B5/04 |
主分类号 |
B08B5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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