| 摘要 |
PROBLEM TO BE SOLVED: To provide a high energy photon source having reliability, high in repetition rate, and good in compatibility with production lines.SOLUTION: Very hot plasma containing an active material is produced in a vacuum chamber. The active material is an atom having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source that includes a charging capacitor and a magnetic compression circuit having a pulse converter, provides electrical pulses having energy and an electrical potential sufficient to produce the EUV light at an intermediate focus at rates exceeding 5 Watts. In a preferred embodiment designed by the applicants, in-band EUV light energy at the intermediate focus is 45 Watts, further extendable to 105.8 Watts. |
