发明名称 REMOTE MONITORING SYSTEM OF POLISHING END POINT DETECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a remote monitoring system that can remotely monitor and control a plurality of polishing end point detection devices.SOLUTION: A remote monitoring system includes: a plurality of polishing end point detection devices 10; and a host computer 20 connected to the plurality of polishing end point detection devices 10 via a network 1. The host computer 20 includes: a memory for storing polishing end point detection data sent from the plurality of polishing end point detection devices 10; and a display screen for displaying the polishing end point detection data. The host computer 20 sends a new polishing end point detection recipe to at least one polishing end point detection device selected from the plurality of polishing end point detection devices 10, and rewrites the polishing end point detection recipe of the selected at least one polishing end point detection device.
申请公布号 JP2013176828(A) 申请公布日期 2013.09.09
申请号 JP20120043174 申请日期 2012.02.29
申请人 EBARA CORP 发明人 MITANI RYUICHIRO
分类号 B24B49/04;B24B37/013;B24B49/10;B24B51/00;H01L21/304 主分类号 B24B49/04
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