| 摘要 |
PURPOSE: The removal of the organic material by the plasma and the removal of the inorganic substance by the high gas are at the same time enforced. The whole cleaning time is reduced the under half. CONSTITUTION: A clean equipment for an organic and inorganic material comprises a supply body(110), a plasma generation part(120), a gas supply part(130), and a exhaust body. The supply body has a installation space(112), a gas passage(115), an air supply hole(113), and a gas exhaust hole(114). The plasma generation part is installed in the installation space. Supplies the gas passage the gas it is connected to the gas supply part is the supply body. The exhaust body is installed in the side part of the supply body. The exhaust body has a gas suction hole and a gas exhaust hole(214) upon inside upon a suction space. |
