发明名称 LOW PRESSURE VAPOR PHASE DEPOSITION OF ORGANIC THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for forming an organic thin film on a substrate 58.SOLUTION: A method for forming an organic thin film on the substrate 58 includes a step of providing a plurality of organic precursors (14, 48) in the vapor phase, and reacting the plurality of organic precursors (14, 48) at less than atmospheric pressure. Also the thin film produced by such a method and an apparatus used to conduct such a method are included. The method is well-suited to the formation of an organic light emitting device and other display-related technologies.
申请公布号 JP2013177692(A) 申请公布日期 2013.09.09
申请号 JP20130104840 申请日期 2013.05.17
申请人 TRUSTEES OF PRINCETON UNIV 发明人 FORREST STEPHEN R;BURROWS PAUL;BAN VLADIMIR S
分类号 C23C14/12;H05B33/10;C23C16/00;C23C16/30;H01L51/00;H01L51/30;H01L51/40;H01L51/50 主分类号 C23C14/12
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