| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing method, a polishing device and a method for manufacturing a photoreceptor that can suppress the removal unevenness of residues on a polished surface of an object having been polished.SOLUTION: A polishing method includes a step of polishing a polished surface of a photoreceptor 10, and a step of bringing the polished surface of the photoreceptor 10 having been polished into contact with the residue removing member 22 and rotating at least one of the photoreceptor 10 and residue removing member 22 so that a contact surface of the residue removing member 22 may move relatively to the polished surface of the photoreceptor 10. The polishing device 100 includes means of polishing the polished surface of the photoreceptor 10, a motor 32 rotating the photoreceptor 10, the residue removing member 22, a motor 20 rotating the residue removing member 22, and a control section 38 which brings the polished surface of the photoreceptor 10 having been polished into contact with the residue removing member 22, and rotating at least one of the photoreceptor 10 and residue removing member 22 so that the contact surface of the residue removing member 22 may move relatively to the polished surface of the photoreceptor 10. |
