| 摘要 |
A vapor deposition source (60), a limiting plate unit (80), and a vapor deposition mask (70) are disposed in this order. The limiting plate unit includes a plurality of limiting plates (81) disposed along a first direction. The side surfaces of the limiting plates defining a limiting space (82) in the first direction are configured such that a portion having a dimension in the first direction of the limiting space between the limiting plates neighboring in the first direction wider than a narrowest portion (81n) having a narrowest dimension in the first direction of the limiting space is formed on at least the vapor deposition source side with respect to the narrowest portion. Accordingly, a coating film whose edge blur is suppressed can be formed at a desired position on a large-sized substrate. |
