发明名称 REMOTE MONITORING SYSTEM FOR POLISHING ENDPOINT DETECTING DEVICE
摘要 <p>PURPOSE: A remote monitoring system of a polishing end point detecting device is provided to reduce detection errors without moving to the polishing end point detecting device by correcting a detection recipe and examining the causes of the detection errors in a polishing end point from a host computer. CONSTITUTION: A plurality of polishing end point detecting devices (10) detect the polishing end point of a substrate. A host computer is connected to the polishing end point detecting devices through a network. A polishing table (30) is connected to a table rotating motor (40) through a table shaft (30a). A top ring shaft (34) is connected to a top ring rotating motor (41) and rotates. A top ring (35) is connected to the lower side of the top ring shaft. The upper side of a polishing pad (32) comprises a polishing surface for polishing the substrate.</p>
申请公布号 KR20130099843(A) 申请公布日期 2013.09.06
申请号 KR20130019151 申请日期 2013.02.22
申请人 EBARA CORPORATION 发明人 MITANI RYUICHIRO
分类号 H01L21/304;H01L21/66 主分类号 H01L21/304
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