PLASMA BOURNDRY LIMITER UNIT, APPARATUS AND METHOD FOR TREATING A SUBSTRATE

摘要

PURPOSE: A plasma boundary limiting unit and a substrate processing apparatus are provided to smoothly exhaust a discharge space of gases by supplying a plurality of plates in the longitudinal direction of a ring body. CONSTITUTION: A processing chamber (100) has a door assembly (140) to open or close an opening part. A support unit (200) is installed in the processing chamber and supports a substrate. A gas supply unit (300) supplies a process gas to the processing chamber. A plasma generating unit (400) generates plasma from the processing gas. A plasma boundary limiting unit (500) surrounds a discharge space located on the upper side of the support unit in the processing chamber. The plasma boundary limiting unit minimizes the plasma outputted from the discharge space.