发明名称 |
DEFECT DETECTION METHOD, DEFECT DETECTION DEVICE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE |
摘要 |
<p>Provided is a defect detection method making it possible to detect a defect in a semiconductor substrate even when the amount of electric current needed to detect the defect is limited. An infrared image indicative of the temperature distribution in a semiconductor substrate when a voltage is applied to a plurality of wires is acquired; the position of a semiconductor element where heat is generated is identified; and, from previously established information on the electrical connection relationships between the positions of a plurality of semiconductor elements and the plurality of wires, it is determined that any of the plurality of wires that is electrically connected to the semiconductor element where heat was generated is a defective wire having a short-circuit.</p> |
申请公布号 |
WO2013128738(A1) |
申请公布日期 |
2013.09.06 |
申请号 |
WO2012JP81077 |
申请日期 |
2012.11.30 |
申请人 |
SHARP KABUSHIKI KAISHA;NAKAJIMA, TAKAHIRO |
发明人 |
NAKAJIMA, TAKAHIRO |
分类号 |
G01N25/72;G01B11/00;G02F1/13 |
主分类号 |
G01N25/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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