发明名称 DEFECT DETECTION METHOD, DEFECT DETECTION DEVICE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
摘要 <p>Provided is a defect detection method making it possible to detect a defect in a semiconductor substrate even when the amount of electric current needed to detect the defect is limited. An infrared image indicative of the temperature distribution in a semiconductor substrate when a voltage is applied to a plurality of wires is acquired; the position of a semiconductor element where heat is generated is identified; and, from previously established information on the electrical connection relationships between the positions of a plurality of semiconductor elements and the plurality of wires, it is determined that any of the plurality of wires that is electrically connected to the semiconductor element where heat was generated is a defective wire having a short-circuit.</p>
申请公布号 WO2013128738(A1) 申请公布日期 2013.09.06
申请号 WO2012JP81077 申请日期 2012.11.30
申请人 SHARP KABUSHIKI KAISHA;NAKAJIMA, TAKAHIRO 发明人 NAKAJIMA, TAKAHIRO
分类号 G01N25/72;G01B11/00;G02F1/13 主分类号 G01N25/72
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