发明名称 SUBSTRATE HOLDING DEVICE, PATTERN TRANSFER DEVICE, AND PATTERN TRANSFER METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate holding device, a pattern transfer device, and a pattern transfer method which properly adjust the distortion of a substrate held.SOLUTION: According to an embodiment, a substrate holding device including a body part, and multiple first support parts is provided. The body part has a main surface. The body part is formed into a plate shape. The multiple first support parts are disposed on the main surface. The multiple first support parts respectively have suction parts that suction the substrate. The suction parts may move along a first direction that is arranged perpendicular to the major surface and a second direction that is arranged parallel to the major surface.
申请公布号 JP2013175595(A) 申请公布日期 2013.09.05
申请号 JP20120039074 申请日期 2012.02.24
申请人 TOSHIBA CORP 发明人 KASA KENTARO;TAKAKUWA MAHO;INENAMI RYOICHI;MATSUKI KAZUTO;NAKASUGI TETSUO;KOIZUMI HIROSHI;INOMOTO MINORU
分类号 H01L21/683;H01L21/027 主分类号 H01L21/683
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