| 摘要 |
A method of fabricating an anti-reflective optically transparent structure includes the steps of providing an optically transparent substrate having a first refractive index and a first surface; and forming an anti-reflective layer within the first surface of the transparent substrate. The anti-reflective layer is made by forming a nano-scale pattern within the first surface defining a subwavelength nano-structured second surface of the anti-reflective layer including a plurality of protuberances having a predetermined maximum distance between adjacent protuberances and a predetermined height for a given wavelength such that the anti-reflective layer includes a second refractive index lower than the first refractive index to minimize light diffraction and random scattering therethrough. The predetermined height is approximately equal to a quarter of the given wavelength divided by the second refractive index. One of nanosphere lithography, deep ultra-violet photolithography, electron beam lithography, and nano-imprinting may be used to form the anti-reflective layer.
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