| 摘要 |
PROBLEM TO BE SOLVED: To accurately predict the position of a defective place generated in a pattern formation step of an integrated circuit.SOLUTION: A processing unit 10 extracts, from each of plural sample patterns stored in a storage unit 20, a first feature vector including a feature quantity relating to a relative positional relation between diagrams making respective sample patterns; on the basis of the extracted first feature vector, generates an identification model to identify the presence or absence of a defective place generated in a pattern formation step of an integrated circuit; and, on the basis of the generated identification model, predicts the defective place in an estimation object pattern. |
