| 摘要 |
<p>There is provided a profile measuring apparatus which measures a profile of an object including: a projection unit which projects a pattern on the object from a projection direction; a measurement unit, which is displaced at a difference position for the projection unit and takes an image of the pattern from a direction different from the projection direction to measure a position on a surface of the object based on an image data obtained with the taken image; an object-rotation unit which rotates the object in two directions; and a pattern-rotation unit which is connected to the projection unit so as to be able to rotate the pattern relative to the object-rotation unit.</p> |
