POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL

摘要

PURPOSE: A positive photoresist composition is provided to form a photoresist pattern having a non-resist unit with the width on the bottom (the surface of a supporter) bigger than the width on the top (the surface of a photoresist layer). CONSTITUTION: A positive photoresist composition contains an acid generator generating acid by irradiating with actinic rays and radiation rays, a resin in which the solubility is increased by acid, alkali metal salt, and an organic solvent. The alkali metal salt is denoted by an equation C1: (W^+)_nX^n-. In the equation, W^+ is an alkali metal ion, X^n- is a monovalent or multivalent counter anion, and n is a fixed number greater than 1. The content of the alkali metal salt is 1,000-100,000 mass ppm for the mass of the acid generator.