发明名称 Particle beam irradiation system and particle beam irradiation method
摘要 A particle beam irradiation system comprising a first deflector having the maximum deflection amount which enables to move a particle beam in one direction to the maximum width of a target and a second deflector having the maximum deflection amount is less than the maximum deflection amount of the first deflector performs a control in which the particle beam is moved by increasing at least a deflection amount of the second deflector when the particle beam is moved, and performs a deflection substitution control in which a deflection of the second deflector is substituted to a deflection of the first deflector by decreasing the deflection amount of the second deflector and changing a deflection amount of the first deflector so as to make a position of the particle beam in the target dwell when the particle beam dwells.
申请公布号 US8525133(B2) 申请公布日期 2013.09.03
申请号 US201013501376 申请日期 2010.10.01
申请人 PU YUEHU;MITSUBISHI ELECTRIC CORPORATION 发明人 PU YUEHU
分类号 G21K5/04 主分类号 G21K5/04
代理机构 代理人
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