发明名称 SEMICONDUCTOR MANUFACTURING DEVICE AND SUBSTRATE HOLDER
摘要 PROBLEM TO BE SOLVED: To provide a substrate holder and a semiconductor manufacturing device, capable of adjusting substrate transfer position of a substrate transfer machine and suppressing degradation of in-plane uniformity of a mounted substrate.SOLUTION: A substrate manufacturing device includes: a substrate holder in which a top plate and a bottom plate are connected together by a plurality of posts extending vertically and a substrate in horizontal attitude is mounted in multiple stages at the posts; a processing chamber processing a substrate mounted on the substrate holder; and a heating part which is provided around the processing chamber, for heating the substrate in the processing chamber. The post of the substrate holder includes a post portion extending vertically and a support portion provided in multiple stages at the post portion to support the substrate. In at least one post among the plurality of posts, a post portion is formed such that an interval between a post portion and a substrate supported by the support portion at an upper end or a lower end of the post is narrower than an interval between the post portion and the substrate supported by the support portion at the central part of the post.
申请公布号 JP2013172016(A) 申请公布日期 2013.09.02
申请号 JP20120035336 申请日期 2012.02.21
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YOSHIDA HIDENARI;TANIYAMA TOMOSHI
分类号 H01L21/22;C23C16/458;H01L21/205;H01L21/31;H01L21/324;H01L21/683 主分类号 H01L21/22
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