发明名称 |
SEMICONDUCTOR MANUFACTURING DEVICE AND SUBSTRATE HOLDER |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holder and a semiconductor manufacturing device, capable of adjusting substrate transfer position of a substrate transfer machine and suppressing degradation of in-plane uniformity of a mounted substrate.SOLUTION: A substrate manufacturing device includes: a substrate holder in which a top plate and a bottom plate are connected together by a plurality of posts extending vertically and a substrate in horizontal attitude is mounted in multiple stages at the posts; a processing chamber processing a substrate mounted on the substrate holder; and a heating part which is provided around the processing chamber, for heating the substrate in the processing chamber. The post of the substrate holder includes a post portion extending vertically and a support portion provided in multiple stages at the post portion to support the substrate. In at least one post among the plurality of posts, a post portion is formed such that an interval between a post portion and a substrate supported by the support portion at an upper end or a lower end of the post is narrower than an interval between the post portion and the substrate supported by the support portion at the central part of the post. |
申请公布号 |
JP2013172016(A) |
申请公布日期 |
2013.09.02 |
申请号 |
JP20120035336 |
申请日期 |
2012.02.21 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
YOSHIDA HIDENARI;TANIYAMA TOMOSHI |
分类号 |
H01L21/22;C23C16/458;H01L21/205;H01L21/31;H01L21/324;H01L21/683 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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