PATTERN FORMING METHOD, PATTERN FORMING DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To maintain an accurate interval between a template and a substrate when a template pattern is brought into contact with a resin on the substrate.SOLUTION: A pattern forming method according to an embodiment for transferring a pattern to a resin on a substrate using a template including the pattern that at least a shape of any of a recess and a salient comprises the steps of: applying the resin onto the substrate; making a first portion which is a part of the resin harder than a second portion which is a portion other than the first portion; and bringing portions other than the pattern of the template into contact with the first portion to maintain an interval between the template and the resin, transferring the shape of the pattern to the second portion in the state and curing the resin.