| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, which enables formation of resin patterns with a large difference of height when resin patterns having different heights are simultaneously formed on the same substrate by use of a halftone mask.SOLUTION: The photosensitive resin composition comprises the following (A), (B), (C) and (D). They are: (A) a copolymer having a structural unit derived from at least one compound selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a structural unit derived from a monomer having a 2-4C cyclic ether structure and an ethylenically unsaturated bond; (B) a polymerizable compound; (C) a polymerization initiator including an oxime compound, in which the content of the oxime compound is 30 mass% or more and 100 mass% or less with respect to the whole amount of the polymerization initiator; and (D) a compound expressed by formula (1). In formula (1), Rrepresents an alkyl group having 1 to 6 carbon atoms; and Ato Aeach independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. |
