| 摘要 |
A projection exposure apparatus that exposes a substrate W with a liquid 7 interposed between a surface of the substrate W and an optical element on the substrate W side of a projection optical system PL; includes liquid supply and discharge mechanisms 5, 6, which supply the liquid 7 via a liquid supply tube 21 as they recover the liquid 7 via a liquid recovery tube 23, and an adhesion preventing mechanism 210 that prevents an adhesion of impurities on member forming a flow path for the liquid. |
