发明名称 LATERAL TRENCH TRANSISTOR, AS WELL AS A METHOD FOR ITS PRODUCTION
摘要 A method for production of doped semiconductor regions in a semiconductor body of a lateral trench transistor includes forming a trench in the semiconductor body and introducing dopants into at least one area of the semiconductor body that is adjacent to the trench, by carrying out a process in which dopants enter the at least one area through inner walls of the trench.
申请公布号 US2013224921(A1) 申请公布日期 2013.08.29
申请号 US201313803291 申请日期 2013.03.14
申请人 INFINEON TECHNOLOGIES AG 发明人 HIRLER FRANZ;WAHL UWE;MEYER THORSTEN;RUEB MICHAEL;WILLMEROTH ARMIN;SCHMITT MARKUS;TOLKSDORF CAROLIN;SCHAEFFER CARSTEN
分类号 H01L29/66 主分类号 H01L29/66
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