发明名称 GAS BARRIER STRUCTURE AND METHOD FOR FORMING GAS BARRIER STRUCTURE
摘要 <p>Provided are: a gas barrier structure provided with a gas barrier layer which ensures excellent gas barrier properties and excellent transparency and which exhibits excellent adhesion, excellent crack resistance and so on; and a method for forming the gas barrier structure efficiently. A gas barrier structure which is provided with a gas barrier layer on the substrate and a method for forming the gas barrier structure, characterized in that the gas barrier layer is a layer which is made from a gas barrier layer forming material that comprises both a polysilazane compound and a polar polymer consisting of a hydroxyl-containing polymer and/or a carboxyl-containing polymer through plasma ion implantation treatment.</p>
申请公布号 WO2013125351(A1) 申请公布日期 2013.08.29
申请号 WO2013JP52747 申请日期 2013.02.06
申请人 LINTEC CORPORATION 发明人 SUZUKI YUTA
分类号 B32B9/00;B32B27/04;B32B27/16 主分类号 B32B9/00
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