EXPOSURE DRAWING DEVICE AND EXPOSURE DRAWING METHOD

摘要

Provided are an exposure drawing device and an exposure drawing method in which it is possible to identify the dust level in the exposure device during an exposure process performed on each substrate to be exposed. This invention is provided with: an exposure means for exposing a substrate to be exposed and thereby drawing a circuit pattern; a counting means for counting the number of microparticles in the exposure drawing device; a determining means for determining whether or not the number of particles counted by the counting means during the exposure process performed by the exposure means is equal to or greater than a threshold value defined on the basis of a size pertaining to the pattern of the circuit pattern; and an adding means for adding information defined in advance with respect to the substrate to be exposed, when it has been determined by the determining means that the number of particles is equal to or greater than the threshold value.