发明名称 Mask and method for forming film using mask
摘要 <p>A mask includes: a tabular first section (44) which includes a side portion and an opening portion (41) formed at a position corresponding to a film formation region (S1) of a substrate (11) and on which the substrate (11) is to be disposed so that the first section (44) overlaps a face (11a) of the substrate (11) on which a film is to be formed; and a second section (43) which is provided along the side portion of the first section (44), and covers at least one of portions of a side face of the substrate (11), wherein second sections (43) of two adjacent masks overlap each other and a superposed section (B) is thereby formed when a plurality of masks (40, 40a, 40b, 140, 142, 240, 240a, 240b, 340, 340a, 340b) are arrayed in a lateral direction thereof.</p>
申请公布号 KR101301611(B1) 申请公布日期 2013.08.29
申请号 KR20117005126 申请日期 2009.10.21
申请人 发明人
分类号 C23C14/04;C23C14/56;H01L31/04 主分类号 C23C14/04
代理机构 代理人
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