SILICON-CONTAINING PHOTORESIST COMPOSITIONS AND METHOD FOR FORMING FINE PATTERNS USING THE SAME,申请号KR20120017119-传众专利搜索

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发明名称	SILICON-CONTAINING PHOTORESIST COMPOSITIONS AND METHOD FOR FORMING FINE PATTERNS USING THE SAME
摘要
申请公布号	KR20130095568(A)	申请公布日期	2013.08.28
申请号	KR20120017119	申请日期	2012.02.20
申请人	KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY	发明人	KIM, JIN BAEK;WOO, SEUNG A
分类号	C08F220/10;C08F220/34;C08F230/08;G03F7/075	主分类号	C08F220/10
代理机构		代理人
主权项
地址

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