A reaction chamber having a reaction spaced defined therein, wherein the reaction space is tunable to produce substantially stable and laminar flow of gases through the reaction space. The substantially stable and laminar flow is configured to improve the uniformity of deposition on substrates being processed within the reaction chamber to provide a predictable deposition profile.
申请公布号
EP2353176(A4)
申请公布日期
2013.08.28
申请号
EP20090825280
申请日期
2009.11.02
申请人
ASM AMERICA, INC.
发明人
GIVENS, MICHAEL;GOODMAN, MATTHEW, G.;HAWKINS, MARK;HALLECK, BRAD;TERHORST, HERBERT