发明名称 |
Patterned retarder film and method for manufacturing |
摘要 |
A patterned retarder film and a method for manufacturing the same are provided. A patterned retarder film with a micro-structure comprises a first substrate, a phase retardation layer on the first substrate comprising a plurality of first retardation regions of liquid crystal materials and a plurality of second retardation regions of curable resin, wherein the structures of the first retardation regions and the second retardation regions are grating-like stripe structures and parallelly interleaved with each other and the first retardation regions provide a first phase retardation and the second retardation regions provide a second phase retardation; and a second substrate laminated on the phase retardation layer; wherein the first phase retardation and the second phase retardation are different by 180°. The method for manufacturing the patterned retarder film is also disclosed
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申请公布号 |
US8520174(B2) |
申请公布日期 |
2013.08.27 |
申请号 |
US20100973045 |
申请日期 |
2010.12.20 |
申请人 |
HUANG KUAN-HAO;WU FUNG-HSU;BENQ MATERIALS CORP. |
发明人 |
HUANG KUAN-HAO;WU FUNG-HSU |
分类号 |
G02F1/1335 |
主分类号 |
G02F1/1335 |
代理机构 |
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地址 |
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