发明名称 Methods of forming and utilizing rutile-type titanium oxide
摘要 Some embodiments include methods of forming rutile-type titanium oxide. A monolayer of titanium nitride may be formed. The monolayer of titanium nitride may then be oxidized at a temperature less than or equal to about 550° C. to convert it into a monolayer of rutile-type titanium oxide. Some embodiments include methods of forming capacitors that have rutile-type titanium oxide dielectric, and that have at least one electrode comprising titanium nitride. Some embodiments include thermally conductive stacks that contain titanium nitride and rutile-type titanium oxide, and some embodiments include methods of forming such stacks.
申请公布号 US8518486(B2) 申请公布日期 2013.08.27
申请号 US20100778893 申请日期 2010.05.12
申请人 MIRIN NIK;HUANG TSAI-YU;BHAT VISHWANATH;CARLSON CHRIS;ANTONOV VASSIL;MICRON TECHNOLOGY, INC. 发明人 MIRIN NIK;HUANG TSAI-YU;BHAT VISHWANATH;CARLSON CHRIS;ANTONOV VASSIL
分类号 C23C16/00 主分类号 C23C16/00
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