发明名称 Nitride semiconductor element with N-face semiconductor crystal layer
摘要 According to one embodiment, the semiconductor element includes a first semiconductor layer. The first semiconductor layer contains AlXGa1-XN. A top layer of the first semiconductor layer is terminated by nitrogen. The semiconductor element includes a second semiconductor layer containing non-doped or first conductivity-type AlYGa1-YN formed on the first semiconductor layer. The semiconductor element includes a third semiconductor layer containing AlZGa1-ZN formed on the second semiconductor layer. The semiconductor element includes a first major electrode connected to the third semiconductor layer. The semiconductor element includes a second major electrode connected to the third semiconductor layer. The semiconductor element includes a gate electrode provided on the third semiconductor layer between the first major electrode and the second major electrode.
申请公布号 US8519439(B2) 申请公布日期 2013.08.27
申请号 US201113239229 申请日期 2011.09.21
申请人 SAITO WATARU;FUJIMOTO HIDETOSHI;KABUHIKI KAISHA TOSHIBA 发明人 SAITO WATARU;FUJIMOTO HIDETOSHI
分类号 H01L29/66 主分类号 H01L29/66
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