NICKEL ALLYL AMIDINATE PRECURSORS FOR DEPOSITION OF NICKEL-CONTAINING FILMS
摘要
Disclosed are nickel allyl amidinate precursors. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit nickel-containing films on one or more substrates via a vapor deposition process.
申请公布号
WO2013098794(A3)
申请公布日期
2013.08.22
申请号
WO2012IB57801
申请日期
2012.12.28
申请人
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;LANSALOT-MATRAS, CLEMENT;YOKOTA, JIRO
