发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
摘要 A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.
申请公布号 US2013216951(A1) 申请公布日期 2013.08.22
申请号 US201313853254 申请日期 2013.03.29
申请人 JSR CORPORATION;JSR CORPORATION 发明人 IKEDA NORIHIKO;NAKAMURA SHIN-ICHI
分类号 G03F7/004 主分类号 G03F7/004
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