发明名称 VERTICAL TRANSISTOR ACTUATION
摘要 A method of actuating a semiconductor device includes providing a transistor including a substrate and a first electrically conductive material layer stack positioned on the substrate. The first electrically conductive material layer stack includes a reentrant profile. A second electrically conductive material layer includes first and second discrete portions in contact with first and second portions of a semiconductor material layer that conforms to the reentrant profile and is in contact with an electrically insulating material layer that conforms to the reentrant profile. A voltage is applied between the first discrete portion and the second discrete portion of the second electrically conductive material layer. A voltage is applied to the first electrically conductive material layer stack to modulate a resistance between the first discrete portion and the second discrete portion of the second electrically conductive material layer.
申请公布号 US2013214845(A1) 申请公布日期 2013.08.22
申请号 US201213401934 申请日期 2012.02.22
申请人 TUTT LEE W.;NELSON SHELBY F. 发明人 TUTT LEE W.;NELSON SHELBY F.
分类号 H03K17/56 主分类号 H03K17/56
代理机构 代理人
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