METHOD FOR MEASURING OVERLAY, MEASURING DEVICE, SCANNING ELECTRON MICROSCOPE, AND GUI

摘要

A method for measuring overlay of a semiconductor device on which a circuit pattern is formed using a plurality of exposure steps, wherein the method for measuring overlay is characterized in being provided with an image-capturing step for capturing an image of a plurality of regions of the semiconductor device, a reference-image-setting step for setting a reference image based on a plurality of images captured in the image-capturing step, a difference-quantifying step for quantifying the difference between the reference image set in the reference-image-setting step and the plurality of images captured in the image-capturing step, and an overlay calculation step for calculating overlay on the basis of the difference quantified in the difference-quantifying step.