发明名称 Optical system i.e. micro-lithographic projection exposure system, for manufacturing e.g. LCD, has lenses arranged relative to each other such that delay distribution is partly compensated by voltage-induced double refraction distribution
摘要 <p>The system has a set of lens groups (510, 520) including a set from two set of lenses (511, 512, 521, 522). One of the two set of lenses is made of cubic crystalline material e.g. fluoride crystal such as calcium fluoride, and comprises equal crystal section, and another set of lenses comprises voltage-induced double refraction is made of amorphous material i.e. quartz glasses. The two set of lenses are arranged relative to each other such that a delay distribution resulting for one of the lens groups is partly compensated by voltage-induced double refraction distribution. An independent claim is also included for a method for micro-lithographic manufacturing of micro-structured components.</p>
申请公布号 DE102012213553(A1) 申请公布日期 2013.08.22
申请号 DE201210213553 申请日期 2012.08.01
申请人 CARL ZEISS SMT GMBH 发明人 SAENGER, INGO;SCHLESENER, FRANK
分类号 G02B27/28;G02B1/02;G02B13/14;G03F7/20 主分类号 G02B27/28
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