发明名称 |
Lithographic Apparatus and Device Manufacturing Method |
摘要 |
A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.
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申请公布号 |
US2013215408(A1) |
申请公布日期 |
2013.08.22 |
申请号 |
US201313748889 |
申请日期 |
2013.01.24 |
申请人 |
ASML NETHERLANDS B.V.;ASML NETHERLANDS B.V. |
发明人 |
VAN DEN NIEUWELAAR NORBERTUS JOSEPHUS MARTINUS;VAN GILS PETRUS FRANCISCUS;SWAVING ARTHUR ERLAND |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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