Mounting table and plasma processing apparatus

摘要

A mounting table for use in a plasma processing apparatus, on which a substrate is mounted, includes: a conductive member connected to a high frequency power supply and a high frequency power supply; a dielectric layer embedded in a central portion on an upper surface of the conductive member; and an electrostatic chuck mounted on the dielectric layer. Further, the electrostatic chuck is connected to a high voltage DC power supply and includes an electrode film satisfying following conditions: delta/z>=85 (where delta=(rhov/(mupif))1/2) and, a surface resistivity of the substrate>a surface resistivity of a central portion of the electrode film.