NANOIMPRINT MOLD, NANOIMPRINT METHOD USING THE SAME, AND MANUFACTURING METHOD OF PATTERNING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To suppress the generation of unfiled defects of a resist film, in nanoimprinting by an ink jet method using a mold having a main pattern and a dummy pattern.SOLUTION: In nanoimprint mold 1 having a pattern area on which minute line-shaped recessed/projecting pattern P is formed on a surface, the pattern area has a main pattern area 2 and a dummy pattern area 3 adjacent to the main pattern area 2. A main direction about the main pattern area 2 and a main direction about the dummy pattern area 3 are structured to be substantially parallel with each other.