| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method capable of reducing influences on processing after imprinting.SOLUTION: In an imprint method in an embodiment, a template pattern formed on a first template is transferred to plural imprint shots on a processed substrate to form a transfer pattern. Then, a resist is dripped in a region of an inter-imprint region that is a region between the imprint shots. Furthermore, a second template different from the first template is brought into contact with the resist, so as to fill the inter-imprint region with the resist. Then, hardening light is radiated to the resist to harden the resist, and the inter-imprint region is filled with the hardened resist. Then, the second template is exfoliated from the resist. |
