PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method, an actinic ray-sensitive or radiation-sensitive resin composition and a resist film, showing high sensitivity, high resolution and excellent line width roughness (LWR) in microprocessing such as formation of a fine pattern in a semiconductor element, particularly, in forming a negative type pattern by organic solvent development, and to provide a method for manufacturing an electronic device and an electronic device using the above method and the composition.SOLUTION: The pattern forming method includes: a step (1) of forming a film by using the following actinic ray-sensitive or radiation-sensitive resin composition; a step (2) of exposing the film by using actinic rays or radiation; and a step (4) of developing the film after exposure by using a developing solution containing an organic solvent to form a negative type pattern. The resin composition comprises: (A) a resin including an acid decomposable repeating unit and showing decrease in the solubility with a developing solution including an organic solvent by an action of an acid; (B) a compound that generates an acid by irradiation with actinic rays or radiation; (C) a compound that is decomposed by an action of an acid to generate an acid; and (D) a solvent. The present invention also discloses an actinic ray-sensitive or radiation-sensitive resin composition to be used for the above pattern forming method, a resist film formed by using the composition, and a method for manufacturing an electronic device and an electronic device using the above pattern forming method.