SEMICONDUCTOR MANUFACTURING APPARATUS, SUBSTRATE TRANSFER DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus which can inhibit an atmosphere containing particles generated by a substrate transfer device from being taken out into a semiconductor manufacturing apparatus.SOLUTION: A semiconductor manufacturing apparatus comprises: a substrate housing case for housing a plurality of substrates; a boat on which a plurality of substrates are loaded; a processing chamber for housing the boat on which the plurality of substrates are loaded and processing the plurality of substrates on the boat; and a substrate transfer device for transferring a substrate between the substrate housing case and the boat. The substrate transfer device comprises: a move part which has a plate for supporting the substrate and linearly moves in a horizontal direction; and a base part which is provided under the move part and has a top plate for supporting the move part. The top plate has a through hole piercing the top plate in a vertical direction and an atmosphere above the top plate is suctioned under the top plate through the through hole.