| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target avoiding generation of arcing and exhibiting high stability during sputtering, and a method of manufacturing the same.SOLUTION: A sputtering target includes zinc oxide and a complex oxide of zinc and tin, and has a main surface with 7.5 or lower color difference &Dgr;E by an L*a*b color system for the main surface. A method includes the steps of: preparing slurry by adding a predetermined binder and a predetermined dispersant to a compound combining respective base powders of zinc oxide (ZnO) and tin oxide (SnO) and mixing them for a predetermined time, and forming a compact of a predetermined shape using the slurry; forming a sintered compact by sintering the compact at a temperature in a range of 1,250-1,550 °C under an atmosphere for 5-50 hours; and forming the main surface by grinding the surface of the sintered compact so that the color difference &Dgr;E by the L*a*b color system for the main surface of the sintered compact becomes 7.5 or lower. |
