| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition capable of being suitably used for an application in which an object to be polished having a phase change alloy is polished, and specifically to provide a polishing composition which is highly effective in the suppression of recess formation.SOLUTION: A polishing composition of the present invention is a polishing composition used for an application in which an object to be polished having a phase change alloy is polished, and contains at least one or more selected from a compound in which two carbonyl groups contained in the molecule are bonded to a carbon atom at the 1-position and a carbon atom at the 3-position. |
