| 摘要 |
A gas cleaning unit for cleaning a main raw gas stream from a plant comprises a plurality of gas cleaning chambers (34a-c), each gas cleaning chamber (34a-c) equipped with a cleaning chamber inlet (46a-c); an inlet manifold (32), for dividing said main raw gas stream flowing therethrough into a plurality of separate fractional raw gas streams for flow to said cleaning chamber inlets (46a-c); and a plurality of heat exchangers (40a-c), each heat exchanger (40a-c) being located downstream of the inlet manifold (32) for exchanging heat with a respective fractional raw gas stream entering a respective cleaning chamber (34a-c).
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