发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 <p>The purpose of the present invention is to provide a charged particle beam apparatus, wherein static electricity is effectively removed from an electrostatic chuck. In order to achieve the purpose, the present invention provides a charged particle beam apparatus that is provided with a sample chamber, in which a space having an electrostatic chuck mechanism (5) therein is maintained in a vacuum state. The charged particle beam apparatus is characterized in that: the apparatus is provided with an ultraviolet light source (6) for irradiating the inside of the sample chamber with ultraviolet light, and a member to be irradiated with the ultraviolet light; and that the member is disposed in the perpendicular line direction of an attracting surface of the electrostatic chuck.</p>
申请公布号 WO2013118594(A1) 申请公布日期 2013.08.15
申请号 WO2013JP51693 申请日期 2013.01.28
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 EBIZUKA YASUSHI;KANNO SEIICHIRO;NISHIHARA MAKOTO;FUJITA MASASHI
分类号 H01J37/20 主分类号 H01J37/20
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