| 摘要 |
The invention relates to a layer structure comprising a substrate layer and a layer, which comprises a plurality of silicon oxide particles, wherein said silicon oxide particles have a positively charged surface (a PCS layer), which PCS layer is at least partially superimposed to the substrate layer and wherein the refractive index of the PCS layer is less than 1.2, a process for preparing the layer structure having a substrate and a PCS layer, a layer structure obtainable by the process, an optical device comprising the layer structure and the use of a PCS layer. |
