ION IMPLANTING APPARATUS

摘要

PURPOSE: An ion implanting apparatus is provided to let a cooling plate within a process chamber contact directly with a mask, thereby improving cooling efficiency. CONSTITUTION: A first platen (10) and a second platen (20) are disposed within a process chamber (100). Each mask is fixed at the first platen and the second platen. An ion implanting unit (40) implants ion in one surface of a substrate that is disposed on one of the first and second platens. Each cooling plate (50) is disposed on the first platen and the second platen. The cooling plate contacts with a mask where ion implantation is completed for cooling the mask.